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Mikroèlektronika
ISSN 0544-1269 (Print)
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Keywords Förster effect bipolar transistor diagnostics etching gas temperature ionization kinetics magnetron sputtering mechanism memristor modeling molecular beam epitaxy plasma polymerization powerful LDMOS quantum dot reduced electric field strength resistive switching silicon silicon-on-insulator technology specific power
Current Issue

Vol 54, No 4 (2025)

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Keywords Förster effect bipolar transistor diagnostics etching gas temperature ionization kinetics magnetron sputtering mechanism memristor modeling molecular beam epitaxy plasma polymerization powerful LDMOS quantum dot reduced electric field strength resistive switching silicon silicon-on-insulator technology specific power
Current Issue

Vol 54, No 4 (2025)

Home > Search > Author Details

Author Details

Sidorov, F. A.

Issue Section Title File
Vol 52, No 2 (2023) ЛИТОГРАФИЯ Cross Sections of Scattering Processes in Electron-Beam Lithography
Vol 54, No 1 (2025) MODELING Calculation of distributions of electron beam energy absorbed in PMMA and Si using various scattering models
 

 

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