作者的详细信息

Бетелин, В. Б.

期	栏目	标题	文件
卷 52, 编号 5 (2023)	ПЛАЗМЕННЫЕ ТЕХНОЛОГИИ	The Influence of Small F2, H2, and HF Additives on the Concentration of Active Particles in Tetrafluoromethane Plasma
卷 52, 编号 2 (2023)	TECHNOLOGIES	Plasma Parameters and Kinetics of Reactive Ion Etching of SiO2 and Si3N4 in an HBr/Cl2/Ar Mixture
卷 53, 编号 6 (2024)	TECHNOLOGIES	Plasma Parameters and Si/SiO₂ Etching Kinetics in Mixtures of Fluorocarbon Gases with Argon and Helium